Eidgenössische Materialprüfungs- und Forschungsanstalt (Empa) / Swiss Federal Laboratories for Materials Science & Technology
Research facility
Location:
Dübendorf,
Switzerland (CH)
ISNI: 0000000123313059
ROR: https://ror.org/02x681a42
The early hydration of Ordninary Portland Cement (OPC): An approach comparing measured heat flow with calculated heat flow from QXRD (2011)
Jansen D, Götz-Neunhoeffer F, Lothenbach B, Neubauer J
Journal article
Low temperature silicon dioxide by thermal atomic layer deposition: Investigation of material properties (2010)
Hiller D, Zierold R, Bachmann J, Alexe M, Yang Y, Gerlach JW, Stesmans A, et al.
Journal article, Original article
Ordered arrays of epitaxial silicon nanowires produced by nanosphere lithography and chemical vapor deposition (2010)
Lerose D, Bechelany M, Philippe L, Michler J, Christiansen S
Journal article
Erratum to "advanced thin film technology for ultrahigh resolution X-ray microscopy" [Ultramicroscopy 109 (2009) 1360-1364] (DOI:10.1016/j.ultramic.2009.07.005) (2010)
Vila-Comamala J, Jefimovs K, Raabe J, Pilvi T, Fink R, Senoner M, Maassdorf A, et al.
Journal article, Erratum
NanoXAS - The in situ combination of scanning transmission X-ray and scanning probe microscopy (2010)
Wenzel S, Fink R, Raabe J, Quitmann C, Hug HJ
Conference contribution, Conference Contribution
NanoXAS, a novel concept for high resolution microscopy (2009)
Fink R, Raabe J, Quitmann C, Hug HJ
Conference contribution, Conference Contribution
A practical, self-catalytic, atomic layer deposition of silicon dioxide (2008)
Bachmann J, Zierold R, Chong YT, Hauert R, Sturm C, Schmidt-Grund R, Rheinlaender B, et al.
Journal article, Original article