Dr. Johannes Will

Orcid ID:

0000-0003-0326-9913

List of publications:

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Lehrstuhl für Werkstoffwissenschaften (Mikro- und Nanostrukturforschung) Lehrstuhl für Kristallographie und Strukturphysik (ICSP)
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Types of publications

Journal article
Book chapter / Article in edited volumes
Authored book
Translation
Thesis
Edited Volume
Conference contribution
Other publication type
Unpublished / Preprint

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Abstract

Journal

Oxygen diffusivity in silicon derived from dynamical X-ray diffraction (2013) Will J, Gröschel A, Kot D, Bergmann C, Steinrück HG, Schubert MA, Kissinger G, Magerl A Journal article, Original article In-situ measurement of thickness-dependent Pendellosung oscillations from a precipitation process in silicon at 650 degrees C (2012) Will J, Gröschel A, Bergmann C, Magerl A Conference contribution, Conference Contribution Thickness dependence of the integrated Bragg intensity for statistically disturbed silicon crystals (2011) Will J, Gröschel A, Weißer M, Magerl A Journal article Structural Defect Studies of Semiconductor Crystals with Laue Topography (2011) Gröschel A, Will J, Bergmann C, Grillenberger H, Eichler S, Scheffer-Czygan M, Magerl A Conference contribution, Conference Contribution In-Situ observation of the oxygen nucleation in silicon with X-Ray single crystal diffraction (2011) Will J, Gröschel A, Bergmann C, Magerl A Conference contribution
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