Compensated Ferrimagnetic Tetragonal Heusler Thin Films for Antiferromagnetic Spintronics

Sahoo R, Wollmann L, Selle S, Hoeche T, Ernst B, Kalache A, Shekhar C, Kumar N, Chadov S, Felser C, Parkin SSP, Nayak AK (2016)

Publication Type: Journal article

Publication year: 2016

Journal

Advanced Materials Wiley

Book Volume: 28

Pages Range: 8499-8504

Journal Issue: 38

DOI: 10.1002/adma.201602963

Involved external institutions

Max-Planck-Institut für Chemische Physik fester Stoffe (MPI CPfS) / Max Planck Institute for Chemical Physics of Solids

Germany (DE) Fraunhofer-Institut für Mikrostruktur von Werkstoffen und Systemen IMWS

Germany (DE) Max-Planck-Institut für Mikrostrukturphysik (MSP) / Max Planck Institute for Microstructure Physics

Germany (DE)

How to cite

APA:

Sahoo, R., Wollmann, L., Selle, S., Hoeche, T., Ernst, B., Kalache, A.,... Nayak, A.K. (2016). Compensated Ferrimagnetic Tetragonal Heusler Thin Films for Antiferromagnetic Spintronics. Advanced Materials, 28(38), 8499-8504. https://doi.org/10.1002/adma.201602963

MLA:

Sahoo, Roshnee, et al. "Compensated Ferrimagnetic Tetragonal Heusler Thin Films for Antiferromagnetic Spintronics." Advanced Materials 28.38 (2016): 8499-8504.

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