Precursor strategies for metallic nano- and micropatterns using soft lithography
Wisser FM, Schumm B, Mondin G, Grothe J, Kaskel S (2015)
Publication Type: Journal article, Review article
Publication year: 2015
Journal
Book Volume: 3
Pages Range: 2717-2731
Journal Issue: 12
DOI: 10.1039/c4tc02418d
Abstract
Soft lithographic methods describe a set of printing methods which are widely used for the preparation of structured surfaces. Structured surfaces are essential components in the field of (opto-)electronic devices such as organic light emitting diodes, photovoltaics or organic field effect transistors. In recent years, crucial progress has been achieved in the development of patterned metal coatings for these applications. This review focusses on new strategies for soft lithographical printing of metal structures emphasizing the subtle interplay of printing techniques, metal precursor chemistry, and surface functionalization strategies. This journal is
Authors with CRIS profile
Involved external institutions
Technische Universität Dresden
Germany (DE)
Fraunhofer-Institut für Werkstoff- und Strahltechnik (IWS) / Fraunhofer Institute for Material and Beam Technology
Germany (DE)
Germany (DE)
Fraunhofer-Institut für Werkstoff- und Strahltechnik (IWS) / Fraunhofer Institute for Material and Beam Technology
Germany (DE)
How to cite
APA:
Wisser, F.M., Schumm, B., Mondin, G., Grothe, J., & Kaskel, S. (2015). Precursor strategies for metallic nano- and micropatterns using soft lithography. Journal of Materials Chemistry C, 3(12), 2717-2731. https://doi.org/10.1039/c4tc02418d
MLA:
Wisser, Florian M., et al. "Precursor strategies for metallic nano- and micropatterns using soft lithography." Journal of Materials Chemistry C 3.12 (2015): 2717-2731.
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