On the Proposed Mechanism of Transpassive Film Formation in Pure Ni in Sulfate Environment: Insights from In Situ Raman Spectroscopy and Respirometry

Hariharan K, Kosanam K, Götz C, Bruns M, Böhm T, Marcus P, Sridhar N, Virtanen S (2026)

Publication Type: Journal article

Publication year: 2026

Journal

Book Volume: 173

Article Number: 031501

Journal Issue: 3

DOI: 10.1149/1945-7111/ae3b17

Abstract

A mechanism for transpassive film formation in pure Ni in a sulfate environment is proposed based on in situ Raman spectroscopy and electrochemistry-coupled respirometry. Based on potentiostatic respirometry on pure Ni in 0.1 M K2SO4, there is a characteristic time-delay before the onset of oxygen evolution, coinciding with the onset of transpassive film formation upon stepping the potential from passive into the transpassive regime. At the same time, in situ Raman spectroscopy revealed that the transpassive film comprised of NiOOH. It reduced back without any time-delay after returning to open-circuit conditions to a passive Ni(OH)2.,.

Authors with CRIS profile

Involved external institutions

Forschungszentrum Jülich / Research Centre Jülich (FZJ) Germany (DE) PSL Research University / Université de recherche Paris Sciences et Lettres France (FR)

How to cite

APA:

Hariharan, K., Kosanam, K., Götz, C., Bruns, M., Böhm, T., Marcus, P.,... Virtanen, S. (2026). On the Proposed Mechanism of Transpassive Film Formation in Pure Ni in Sulfate Environment: Insights from In Situ Raman Spectroscopy and Respirometry. Journal of The Electrochemical Society, 173(3). https://doi.org/10.1149/1945-7111/ae3b17

MLA:

Hariharan, Karthikeyan, et al. "On the Proposed Mechanism of Transpassive Film Formation in Pure Ni in Sulfate Environment: Insights from In Situ Raman Spectroscopy and Respirometry." Journal of The Electrochemical Society 173.3 (2026).

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